Nanomaterial film deposition solution
Suitable for the film formation of nanomaterials (metal nanoparticles, nanowires, nanosheets, materials for nanoelectronics)!
The "TFE News Sputtering Series" is a research and development as well as small-scale production system with a variety of functions. It is a compact sputtering device capable of high-temperature film deposition of metal films and dielectric films for nanomaterials such as metal nanoparticles, nanowires, and nanosheets, with temperatures up to 800°C. Additionally, it offers the option of manual or automatic load lock, and features complete automatic control via PLC and PC, as well as remote control over the internet. This sputtering device is recommended for engineers seeking high substrate heating temperatures (maximum heating temperature: 800°C) for thin film deposition of nanomaterials. 【Features】 ■ Suitable for thin film deposition of nanomaterials (metal nanoparticles, nanowires, nanosheets, materials for nanoelectronics) ■ Capable of 800°C substrate heating, which is difficult with other devices ■ Cost-effective sputtering with substrate rotation *For more details, please feel free to contact us.
- Company：プラズマ・サーモ・ジャパン
- Price：Other
